Mask Manufacturing

Photolithography Mask are carriers of the information about the structure of the integrated circuit (IC) per functional layer. They are complex products with high demands on precision and integrity that are exposed to high energy light during exposure.

Decreasing line width and tighter demands on line quality on semiconductor structures translate to increasing specifications on precision for photolithography masks.

To produce high quality masks pure air is mandatory for the steps of substrate preparation, coating, mask writing, inspection and final coverage. High purity of the mask as delivered is a key enabler for its  long-lasting use in the semicon manufacturing process. Ultra pure mask storage conditions during and in between productive exposure helps maintaining the image quality over extended periods of time and supports minimum re-work.

artemis control provides manfacturers and users of photolithography masks with system solutions, on-line contamination assessment and contamination control. Solutions span the manufacturing chain from substrate handling, structuring to storage of mask as a complete concept.