UV exposure tools in the form of DUV steppers and DUV scanners are central and critical units in the production process of semiconductors.
By means of monochromatic UV radiation at wavelengths of 248 nm and 193 nm the structures which are intended to be formed in the next manufacturing process, e.g. by an etching process, are transferred from the photomask to the substrate.
Until the chip product has been completed, the exposure process is gone through several times. For this reason the exposure units become highly utilized processing units and the utmost is demanded from their utilisability. The same applies for the high-purity air which is required for the operation of the equipment.
The combination of different air components in trace concentrations under short-wave high-energy radiation causes problematic contaminations of the optic elements which would not occur without exposure to light. Lenticular opacities caused by traces of acidic and basic trace substances, formation of carbon deposits or vitreous film formations are effects which certainly have to be prevented. Therefore, the cleanroom air is further purified at the transfer point from the cleanroom into the exposure tool by means of filter cascades of specific AMC filters.
artemis control has developed and qualified the AMC filter for the operation of DUV exposure tools. The units of the SPF series are characterized by a high and long-lasting purification capacity and were developed with respect to the range of contaminants, e.g. glass-forming organo-silicon compounds. This was rendered possible on the basis of development and manufacturing expertise in raw materials, filter composites and filter components.
As is customary for products of artemis control, the performance parameters of the components are modularly customizable in order to realize an optimal cost-performance ratio.
The components of the SPF series are available both as elements for the installation in the exposure units and peripherals as well as in the form of stand-alone, complete pre-filtration units.
